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Kinetic model for resist polymer dissolution
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We combine such experimental analysis with simulation of the kinetic of dissolution using in-house
software tools. The general kinetic model is depicted below. The solubility switch is an
adaptation of the Critical Ionizaton model1-3; in this adaptation, aqueous base penetrates the polymer
film, polymer sites are reversible deprotonated by hydroxide ion, and once a critical number of polymer
sites are ionized the chain is surrounded by water and dissolved.
Such simulations predict structure and composition as a function of time following immersion in
developer. As an exmaple, Predictions of how film dissolution is affected by the relative
rate of deprotonation of the polymer for a specific set of conditions is shown below. Depending on the deprotonation
rate, film dissolution can occur by (left to right) full swelling of the entire film, formation of a
significant but distinct interfacial layer, or surface-limited dissolution akin to the etching of
metals.
References
- P. C. Tsiartis, et al Macromolecules 30, 4656 (1997).
- L. W. Flanagin, et al Macromolecules 32, 5337 (1999).
- F. A. Houle, et al, Macromolecules 35, 8591 (2002).
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| QCM/Reflectance Analysis of Polymer Dissolution Kinetics
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| Kinetic Model for Resist Polymer Dissolution
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| | Teas Solubility Parameter Map
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