The images below show the nanostructured inorganics containing cylindrical pores and lamellar morphology. Mechanical robustness and thermal stability of the nanostructure make it possible to use them as a high temperature nanotemplate. The lamellae in the images show 20nm in half-pitch, which is very attractive as an alternative patterning method for sublithographic line patterns. The inorganic nature of the nanostructure gives high etch contrast for use them as an etch mask for plasma etching.