Simulations of polymer dissolution using VSIM, a coupled reaction-diffusion simulator

VSIM is a simulator that extends the computational methods used in Chemical Kinetics Simulator 1.x to systems in which chemical reactions and mass and energy transport are coupled. We are using it to simulate coupled swelling and dissolution behaviors in polymers in order to understand fundamental aspects of photoresist development. (F. Houle and W. Hinsberg)

Characterization of air photochemistry in photolithographic tools

Using known gas kinetics from the literature we are calculating photoproduct formation in air during 193nm pulsed laser exposure of photoresists under a variety of scenarios. Trace species such as acids and strong oxidizers are formed and have a potential for influencing resist imaging. (W. Hinsberg and F. Houle)

If you have further questions about the Chemical Kinetics Simulator package, find errors in the CKS and Kinetics Simulation Project pages or have any comments about them, please send e-mail to hnsbrg@almaden.ibm.com.