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Particle Induced X-ray Emission (PIXE)
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Irradiation of the analytical sample by the MeV ion beam causes characteristic K and L x-rays to be emitted. Every element in the periodic table has a unique x-ray “fingerprint”. This enables quantitative element-specific analysis of the sample.
PIXE has the following characteristics:
- Optimal depth range 0-1000Å
- Quantitative without standards
- High precision (typically ±3%)
- High sensitivity (e.g. 1013 Au/cm2 on Si) for sub-ppm contaminants
Typical Applications:
- Magnetic multilayers - storage media and head structures
- Sub-ppm contaminants in thin film materials/surface/interface
- Elemental composition (precision to ±0.2 at.%)
- Wear debris/particulates
- Multi-elemental concentration profiles
Typical example of PIXE analysis: PIXE spectrum of a spin-valve type recording head, which has many thin layers composed of similar mass elements. The technique is able to mass-resolve adjacent elements, which would not be resolvable with RBS.
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